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双(磺丙基)二硫化钠

0.0
0.0
1000
同义词:
SPS
CAS 编号:
27206-35-5
-
+
:
0
1
关键词:
描述
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化学名称

双(磺丙基)二硫化钠

同义词

SPS

CAS 编号

27206-35-5

EINECS 编号

248-324-3

分子式

C6H12O6S4Na2

分子量

354.4

分子结构

<trp-post-container data-trp-post-id='1008'>Bis-(sodium sulfopropyl)-disulfide</trp-post-container>

细节

Appearance: White powder

Assay: 95% or 90% min

Melting point: 197~198℃

Addition level : 0.01~0.02g/l

Consumption (g/KAH): 0.5~0.8

 

主要应用

It is used as brightening agent & functional grain refinement agent for copper plating and combined with DAE, EDEP and so on.

 

 

Bis-(sodium sulfopropyl)-disulfide, commonly abbreviated as SPS, is a specialized organosulfur compound used primarily as a brightener additive in the electroplating industry—particularly for acid copper plating. It contains disulfide and sulfonate groups, making it highly effective in controlling deposit structure and appearance during metal plating.

1. Acid Copper Electroplating Brightener

SPS is widely used as a key brightener and grain refiner in acid copper baths, especially in the manufacturing of printed circuit boards (PCBs) and semiconductor components. It works synergistically with accelerators and suppressors to achieve uniform, high-gloss, fine-grained copper deposits.

2. Via-Filling and Microelectronic Applications

In advanced electronics manufacturing, SPS plays a crucial role in via-filling and damascene processes, promoting void-free copper deposition with excellent leveling characteristics—critical for high-density interconnects and IC fabrication.

3. Improved Deposit Morphology

SPS improves the microstructure of copper layers, resulting in smoother surfaces, better ductility, and lower internal stress. This is essential for ensuring mechanical reliability in electronic devices.

4. Stable and Water-Soluble Additive

Its high water solubility and chemical stability make it easy to integrate into plating baths with consistent performance across long production cycles.

5. Synergistic Performance

SPS works in conjunction with other additives like PEGs (suppressors) and thiourea derivatives (accelerators), enhancing overall control of plating speed, gloss, and deposit quality.

 

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